晶圓旋乾機/Wafer spin dry / cassette spin dry
電洽
晶圓ˋ晶舟旋乾機 / Wafer & cassette spin dry
1. 可清洗晶圓 / 晶舟後.再烘乾
2. 濕製程後. 晶圓.晶舟旋乾.烘乾
3. 適用尺寸2”~18” Wafers
Content : 1. Clean wafer & cassette
2. After wet process. Wafer & cassette spin dry